Vertical transistor structures having vertical-surrounding-gates with self-aligned features

ABSTRACT

The present inventions include a vertical transistor formed by defining a channel length of the vertical-surrounding-gate field effect transistor with self-aligning features. The method provides process steps to define the transistor channel length and recess silicon pillars used to form the vertical-surrounding gate field effect transistor structure for use in the manufacture of semiconductor devices.

FIELD OF THE INVENTION

This invention relates to semiconductor fabrication processing and, moreparticularly, to a method for forming a vertical-surrounding-gate fieldeffect transistor for semiconductor devices, such as dynamic randomaccess memories (DRAMs).

BACKGROUND OF THE INVENTION

The continuing trend of scaling down integrated circuits has motivatedthe semiconductor industry to consider new techniques for fabricatingprecise components at sub-micron levels. As is the case for mostsemiconductor integrated circuitry, circuit density is continuing toincrease at a fairly constant rate and a major makeup of many integratedcircuits is the field effect transistor (FET). The typical FET structureis formed in a silicon substrate, with the source/drain implanted intothe horizontal substrate surface, the channel spanning there between andthe gate formed over the channel. A second FET structure is a verticaloriented transistor, such as a vertical-sided-gate field effecttransistor (VSGFET).

The VSGFET structure is oriented such that the source/drain and channelof the transistor are formed vertically in a silicon substrate byforming vertical silicon pillars in the silicon substrate, while thegate wraps around the channel region of the vertical pillars. A keyaspect in forming the VSGFET is in the definition of the gate length.One fabrication approach to define the gate length of a VSGFET isdepicted in FIG. 1-5.

The overhead view of FIG. 1 shows a series of circular nitride hardmasks 11 defining columns of vertical silicon pillars separated byshallow trench isolation 12. A cross-section taken through line 1-1′ ofFIG. 1 is depicted in FIG. 2. As seen in FIG. 2, the vertical siliconpillars 20 are formed by etching into the silicon substrate 10 by usingthe nitride hard mask 11 as an etching guide. Shallow trench isolation12 is formed between each column of silicon pillars.

As shown in FIG. 3, a conformal gate dielectric 30 is formed on thesubstrate surface such that it coats the horizontal surface of siliconsubstrate 10, the shallow trench isolation 12, the vertical sidewalls ofthe silicon pillars 20 and the nitride hard mask 11.

As shown in FIG. 4, a polysilicon 40 is deposited to fill the spacesbetween the silicon pillars 20. Then the polysilicon 40 is planarizedalong with a top portion of the nitride hard mask 11.

As shown in FIG. 5, the polysilicon 40 is recessed to a designedthickness, which will expose an upper portion of the gate dielectric 30as well as define the gate channel length of the vertical gatedtransistor. This approach has two main potential problems in that therecessing of polysilicon 40, typically by a plasma etch, has thetendency to damage the gate dielectric/polysilicon interface and theplasma etch causes unavoidable round corners 50 above the majorhorizontal surface of the vertical-surrounding-gate at the gatedielectric/polysilicon interface. These rounded corners 50 will increasegate channel length variation across the silicon substrate 10.Furthermore any misalignment between the gate polysilicon pattern andthe silicon pillar 20 will increase the serial resistance of eachtransistor structure along with potential gate damage due to exposingthe silicon channel.

The present invention describes a vertical-surrounding gate field effecttransistor formed by a method to define a gate channel length for avertical-surrounding gate field effect transistor with self-aligningfeatures that addresses the above challenges, the method disclosedherein for use in the manufacture of semiconductor devices orassemblies, which will become apparent to those skilled in the art fromthe following disclosure.

SUMMARY OF THE INVENTION

Exemplary implementations of the present invention include a verticaltransistor and a method to form a vertical transistor that defines agate length for the vertical-surrounding gate field effect transistorwith self-aligning features. The method provides process steps to definethe transistor channel length and recess silicon pillars used to formthe vertical-surrounding gate field effect transistor structure for usein the manufacture of semiconductor devices.

BRIEF DESCRIPTION OF THE DRAWING

FIG. 1 is top-down view of a pattern of silicon pillars from a prior artmethod to define vertical-surrounding-gate field effect transistor.

FIG. 2 is a cross-sectional view taken through line 1-1′ of FIG. 1showing a semiconductor substrate section depicting vertical siliconpillars topped by nitride hard mask and separated by shallow trenchisolation.

FIG. 3 is a subsequent cross-sectional view taken from FIG. 2 followingthe formation of a conformal gate dielectric layer over the siliconsubstrate assembly.

FIG. 4 is a cross-sectional view taken from FIG. 3 following theformation of a planarized polysilicon material between the siliconpillars.

FIG. 5 is a cross-sectional view taken from FIG. 4 following therecessing of the polysilicon material to define the length of thevertical-surrounding-gate for a field effect transistor.

FIG. 6 depicts an embodiment of the present invention showing a top-downview of a silicon substrate section having columns of shallow trenchisolation formed therein.

FIG. 7 is a cross-sectional view taken through line 2-2′ of FIG. 6showing the cross-section of the silicon substrate section having thecolumns of shallow trench isolation formed therein.

FIG. 8 is a cross-sectional view taken from FIG. 7 following theformation of a circular patterned nitride mask separated by TEOS oxide.

FIG. 9 is a cross-sectional view taken from FIG. 8 following a partialetch of the silicon substrate to form partial silicon pillars.

FIG. 10 is a cross-sectional view taken from FIG. 9 following theformation of nitride spacers on the partial silicon pillars.

FIG. 11 is a cross-sectional view taken from FIG. 10 following an etchto define the channel length of the vertical-surrounding-gate of thetransistor.

FIG. 12 is a cross-sectional view taken from FIG. 11 following anoptional etch to recess into the exposed silicon of the silicon pillars.

FIG. 13 is a cross-sectional view taken from FIG. 12 following theformation of a transistor gate dielectric.

FIG. 14 is a cross-sectional view taken from FIG. 13 following theformation a conformal polysilicon material over the silicon substrate,the shallow trench isolation, the nitride spacers, the nitride cappedsilicon pillars and the gate dielectric.

FIG. 15 is a cross-sectional view taken from FIG. 14 following theformation and planarization of silicon pillar isolation material.

FIG. 16 is a cross-sectional view taken from FIG. 15 following therecessing of the conformal polysilicon material to form thevertical-surrounding-gate of the transistor.

FIG. 17 is a cross-sectional view taken from FIG. 16 following ananti-reflective coating to fill the gap between the silicon pillars andthe forming and patterning of an overlying photoresist.

FIG. 18 is a cross-sectional view taken from FIG. 17 following an etchof the conformal polysilicon material to form word lines.

FIG. 19 is a cross-sectional view taken from FIG. 18 following thedeposition of insulation material to fill the gap around the siliconpillars and a planarization etch to expose the upper surface of thesilicon pillars.

FIG. 20 is a cross-sectional view taken from FIG. 19 following theformation of container capacitors, each connecting to an underlyingexposed silicon pillar.

FIG. 21 is a simplified block diagram of a semiconductor systemcomprising a processor and memory device to which the present inventionmay be applied.

DETAILED DESCRIPTION OF THE INVENTION

In the following description, the terms “wafer” and “substrate” are tobe understood as a semiconductor-based material including silicon,silicon-on-insulator (SOI) or silicon-on-sapphire (SOS) technology,doped and undoped semiconductors, epitaxial layers of silicon supportedby a base semiconductor foundation, and other semiconductor structures.Furthermore, when reference is made to a “wafer” or “substrate” in thefollowing description, previous process steps may have been utilized toform regions or junctions in or over the base semiconductor structure orfoundation. In addition, the semiconductor need not be silicon-based,but could be based on silicon-germanium, silicon-on-insulator,silicon-on-saphire, germanium, or gallium arsenide, among others.Embodiments of the present invention provide disclose avertical-surrounding-gate field effect transistor and a method offorming a vertical-surrounding-gate field effect transistor (VSGFET) forsemiconductor assemblies.

Exemplary implementations of the present invention are directed to avertical-surrounding-gate field effect transistor and the processes forforming a surrounding-gate field effect transistor in a semiconductordevice, as depicted in the embodiments of FIGS. 6-21.

FIG. 6 depicts an embodiment of the present invention showing thebeginning stage of the process in a top-down view of a silicon substratesection 60 having columns of shallow trench isolation 61 formed thereinby conventional process steps.

FIG. 7 is a cross-sectional view taken through line 2-2′ of FIG. 6showing the cross-section of silicon substrate section 60 having columnsof shallow trench isolation 61 formed therein and an remaining layer ofpad oxide overlying the silicon substrate section 60 between shallowtrench isolation 61. As stated, conventional process steps know to oneof ordinary skill in the art can be used to form the shallow trenchisolation orientation depicted in FIG. 7.

Referring now to FIG. 8, a tetra-ethyl-ortho-silicate (TEOS) oxide 80 isformed on the surface of silicon substrate section 60 and shallow trenchisolation 61. TEOS oxide 80 is patterned with circular holes therein andfilled with a masking material, such as nitride, to form a circularpatterned hard mask 81.

Referring now to FIG. 9 a partial etch is performed to define andpartially form silicon pillars 90 while using hard mask 81. When nitrideis used as the hard mask material, this etch will remove TEOS oxide 80selective to nitride hard mask 81. A second etch is then preformed toetch STI oxide 61 and the silicon substrate 60 to form partial siliconpillars 90. The second etch defines the source region 91 of asubsequently formed vertical-surrounding-gate transistor, which isapproximately one half the total length of the silicon pillars 90, theimportance of which is shown later in the process.

Referring now to FIG. 10, a conformal nitride layer is deposited overthe substrate assembly, followed by a nitride spacer etch that removesthe nitride from the substrate assembly except along the substantiallyvertical sidewalls of the partial silicon pillars 90, thus formingnitride spacers 100 thereon.

Referring now to FIG. 1, an etch is performed to define the length ofthe vertical-surrounding-gate of the transistor. Once again, using hardmask 81, the STI oxide 61 and the silicon substrate 60 is etched down toa desired depth starting at the base of nitride spacers 100 to increasethe length of silicon pillars 90 and to establish the channel length 110of the completed vertical-surrounding-gate transistor. Once the partialetch of the silicon pillars is performed and the nitride spacers formedthereon using the process steps described in FIGS. 9 and 10, thesubsequent etch allows for an effective and reliable method to establishthe desired channel length and height of the vertical-surrounding-gatetransistor.

Referring now to FIG. 12, an optional etch is performed to recess intothe exposed silicon of the silicon pillars 90 below the nitride spacers100. By using this optional etch step, the exposed portion of siliconpillars 90 is recessed horizontally approximately the width of nitridespacers 100. This option is preferred as it adds process margin whenetching the final polysilicon gate as described in the process stepsassociated with FIG. 16.

Referring now to FIG. 13, a transistor gate dielectric 130, such asoxide, is formed first by either depositing a gate dielectric or byoxidizing the exposed portions of silicon pillars 90 and siliconsubstrate 60.

Referring now to FIG. 14, a conformal polysilicon material 140 isdeposited over the substrate assembly including, silicon substrate 60,the shallow trench isolation 61 and the nitride capped and nitride linedsilicon pillars 90, and the gate dielectric 130. The conformalpolysilicon material 140 will eventually become thevertical-surround-gate for each silicon pillar 90.

Referring now to FIG. 15, a silicon pillar isolation material 150, suchas the individual components of (or the combination thereof)borophosphosilicate glass (BPSG), phosphosilicate glass (PSG), or a spinon dielectric (SOD), is formed over the conformal polysilicon material140. Next, a planarization step, such as a chemical-mechanicalplanarization (CMP) step, is performed to planarize the substrateassembly surface.

Referring now to FIG. 16, an etch step is performed to recess theconformal polysilicon material 140 down to the base of the nitridespacers 100 to form the vertical-surrounding-gate 160 of the transistor.The etch may stop at the base of the nitride spacers 100, however it isnot critical and it is instead preferred that should the silicon channelbe recessed as described in the optional step depicted in FIG. 12, thepolysilicon material 140 may be recessed below nitride spacers 100,which allows for greater etching process margin.

Referring now to FIG. 17, an anti-reflective coating 170 is formed tofill the gaps between the silicon pillars 90 to protect the siliconpillars from a subsequent etch. Next, an overlying photoresist 171 isformed and patterned to define word line conductors connecting between aseries (a column) of vertical-surrounding-gates 160.

Referring now to FIG. 18, an etch is performed to form the word linesconnecting to and running perpendicular to the polysilicon gate material160. The result of the above polysilicon etches of polysilicon material160 will finally recess the conformal polysilicon material 160 to thebase of the nitride spacers 100 to form a vertical-surrounding-gate 160of each vertical transistor structures such that the distance between anactive area of the silicon pillars 90 and any portion of the recessedconformal polysilicon material 160 that may be present along the nitridespacers 100 (represented by section 192) is great enough to prevent aninversion of the active area during an active state of a verticaltransistor structure and thus will not extend the length of the verticaltransistor channel.

Referring now to FIG. 19, a deposition of insulation material 190, suchas SOD, TEOS oxide or BPSG, is performed to fill the gaps around thesilicon pillars 90. Next an etch, such as by CMP or a blanket etch, isperformed to expose the upper surface of the silicon pillars 90 tocreate a surface for a vertical-surrounding-gate source contact 191. Aplanarization process know to those skilled in the art is preferred inorder to obtain a planar surface by removing nitride caps 81 (seen inFIG. 18) while exposing the upper portion of silicon pillars 90.

Referring now to FIG. 20, individual container capacitor structures 200are formed such that each lower capacitor plate connects to anunderlying exposed silicon pillar 90. The container capacitors arecompleted by the formation of a conformal capacitor cell dielectric 201and a polysilicon capacitor top plate 202.

The vertical-surrounding-gate field effect transistors of the presentinvention as constructed in semiconductor devices may be applied to asemiconductor system, such as the one depicted in FIG. 21. FIG. 21represents a general block diagram of a semiconductor system, thegeneral operation of which is known to one skilled in the art, thesemiconductor system comprising a processor 212 and a memory device 213showing the basic sections of a memory integrated circuit, such as rowand column address buffers 214 and 215, row and column decoders, 216 and217, sense amplifiers 218, memory array 219 and data input/output 2200,which are manipulated by control/timing signals from the processorthrough control 221.

It is to be understood that although the present invention has beendescribed with reference to a preferred embodiment, variousmodifications, known to those skilled in the art, such as utilizing thedisclosed methods to form a vertical-surrounding-gate field effecttransistor in any semiconductor device or semiconductor assembly, may bemade to the process steps presented herein without departing from theinvention as recited in the several claims appended hereto.

1. A method of forming a semiconductor assembly having verticaltransistor structures comprising: forming columns of trench isolationmaterial in a silicon substrate; forming circular patterned hard maskmaterial in circular holes in an insulation material overlying thesilicon substrate; forming partial silicon pillars by removing an upperportion of the silicon substrate while using the hard mask material asan etching mask; forming nitride spacers on sidewalls of the partialsilicon pillars; with the hard mask material in place, etching thetrench isolation material and the silicon substrate to a desired depthto form silicon pillars, each having a defined channel length determinedby extending the partial silicon pillars in a vertical direction belowthe nitride spacers; forming a gate dielectric on an exposed portion ofthe silicon pillars below the nitride spacers; depositing a conformalpolysilicon material over the silicon substrate, the trench isolationmaterial, the hard mask material, the nitride spacers and the transistorgate dielectric; forming a silicon pillar isolation material over theconformal polysilicon material; planarizing the conformal polysiliconmaterial and the silicon pillar isolation material; recessing theconformal polysilicon material down to a base of the nitride spacers toform a vertical-surrounding-gate of the vertical transistor structures;forming an anti-reflective coating to fill the gap between the siliconpillars; patterning a photoresist overlying the anti-reflective coatingto define conductors connecting to a series ofvertical-surrounding-gates; etching the polysilicon material to form theconductors from the polysilicon gate material; depositing an insulationmaterial to fill any gaps around the silicon pillars; exposing the uppersurface of the silicon pillars to create a surface for avertical-surrounding-gate source contact.
 2. The method of claim 1,wherein the insulation material is a tetra-ethyl-ortho-silicate (TEOS)oxide.
 3. The method of claim 1, wherein the circular patterned hardmask material is nitride.
 4. The method of claim 1, wherein the formingof the partial silicon pillars comprises an etch that definesapproximately one half the total length of the silicon pillars.
 5. Themethod of claim 1, further comprising etching a horizontal component ofexposed portions of the silicon pillars below the nitride spacers toapproximately the width of nitride spacers.
 6. The method of claim 1,wherein the silicon pillar isolation material is a material selectedfrom the group consisting essentially of borophosphosilicate glass(BPSG), phosphosilicate glass (PSG), or a spin on dielectric (SOD). 7.The method of claim 1, wherein the planarizing the conformal polysiliconmaterial and the silicon pillar isolation material compriseschemical-mechanical planarization (CMP).
 8. The method of claim 1,wherein the recessing of the conformal polysilicon material continuesbelow the base of the nitrides spacers.
 9. The method of claim 1,wherein the insulation material to fill any gaps around the siliconpillars is a material selected from the group consisting essentially ofborophosphosilicate glass (BPSG), phosphosilicate glass (PSG), or a spinon dielectric (SOD).
 10. The method of claim 1, wherein exposing theupper surface of the silicon pillars to create a surface for avertical-surrounding-gate source contact comprises chemical-mechanicalplanarization (CMP).
 11. A method of forming vertical transistorstructures for a semiconductor assembly comprising: forming columns oftrench isolation material in a silicon substrate; forming circularpatterned hard mask material in circular holes in an insulation materialoverlying the silicon substrate; forming partial silicon pillars byremoving an upper portion of the silicon substrate while using the hardmask material as an etching mask; forming nitride spacers on sidewallsof the partial silicon pillars; with the hard mask material in place,etching the trench isolation material and the silicon substrate to adesired depth to form silicon pillars, each having a defined channellength determined by extending the partial silicon pillars in a verticaldirection below the nitride spacers; etching a horizontal component ofexposed portions of the silicon pillars below the nitride spacers toapproximately the width of nitride spacers; forming a gate dielectric onan exposed portion of the silicon pillars below the nitride spacers;depositing a conformal polysilicon material over the silicon substrate,the trench isolation material, the hard mask material, the nitridespacers and the transistor gate dielectric; forming a silicon pillarisolation material over the conformal polysilicon material; planarizingthe conformal polysilicon material and the silicon pillar isolationmaterial; recessing the conformal polysilicon material down to a base ofthe nitride spacers to form a vertical-surrounding-gate of the verticaltransistor structures; forming an anti-reflective coating to fill thegap between the silicon pillars; patterning a photoresist overlying theanti-reflective coating to define conductors connecting to a series ofvertical-surrounding-gates; etching the polysilicon material to form theconductors from the polysilicon gate material; depositing an insulationmaterial to fill any gaps around the silicon pillars; exposing the uppersurface of the silicon pillars to create a surface for avertical-surrounding-gate source contact.
 12. The method of claim 11,wherein the insulation material is a tetra-ethyl-ortho-silicate (TEOS)oxide.
 13. The method of claim 11, wherein the circular patterned hardmask material is nitride.
 14. The method of claim 11, wherein theforming of the partial silicon pillars comprises an etch that definesapproximately one half the total length of the silicon pillars.
 15. Themethod of claim 11, wherein the silicon pillar isolation material is amaterial selected from the group consisting essentially ofborophosphosilicate glass (BPSG), phosphosilicate glass (PSG), or a spinon dielectric (SOD).
 16. The method of claim 11, wherein the planarizingthe conformal polysilicon material and the silicon pillar isolationmaterial comprises chemical-mechanical planarization (CMP).
 17. Themethod of claim 11, wherein the recessing of the conformal polysiliconmaterial continues below the base of the nitrides spacers.
 18. Themethod of claim 11, wherein the insulation material to fill any gapsaround the silicon pillars is a material selected from the groupconsisting essentially of borophosphosilicate glass (BPSG),phosphosilicate glass (PSG), or a spin on dielectric (SOD).
 19. Themethod of claim 11, wherein exposing the upper surface of the siliconpillars to create a surface for a vertical-surrounding-gate sourcecontact comprises chemical-mechanical planarization (CMP).
 20. A methodof forming a semiconductor assembly having memory cells with verticaltransistor structures comprising: forming columns of trench isolationmaterial in a silicon substrate; forming circular patterned hard maskmaterial in circular holes in an insulation material overlying thesilicon substrate; forming partial silicon pillars by removing an upperportion of the silicon substrate while using the hard mask material asan etching mask; forming nitride spacers on sidewalls of the partialsilicon pillars; with the hard mask material in place, etching thetrench isolation material and the silicon substrate to a desired depthto form silicon pillars, each having a defined channel length determinedby extending the partial silicon pillars in a vertical direction belowthe nitride spacers; forming a gate dielectric on an exposed portion ofthe silicon pillars below the nitride spacers; depositing a conformalpolysilicon material over the silicon substrate, the trench isolationmaterial, the hard mask material, the nitride spacers and the transistorgate dielectric; forming a silicon pillar isolation material over theconformal polysilicon material; planarizing the conformal polysiliconmaterial and the silicon pillar isolation material; recessing theconformal polysilicon material down to a base of the nitride spacers toform a vertical-surrounding-gate of the vertical transistor structures;forming an anti-reflective coating to fill the gap between the siliconpillars; patterning a photoresist overlying the anti-reflective coatingto define conductors connecting to a series ofvertical-surrounding-gates; etching the polysilicon material to form theconductors from the polysilicon gate material; depositing an insulationmaterial to fill any gaps around the silicon pillars; exposing the uppersurface of the silicon pillars to create a surface for avertical-surrounding-gate source contact; and forming a capacitorstructure connecting the silicon pillars at thevertical-surrounding-gate source contact.
 21. The method of claim 20,wherein the insulation material is a tetra-ethyl-ortho-silicate (TEOS)oxide.
 22. The method of claim 20, wherein the circular patterned hardmask material is nitride.
 23. The method of claim 20, wherein theforming of the partial silicon pillars comprises an etch that definesapproximately one half the total length of the silicon pillars.
 24. Themethod of claim 20, further comprising etching a horizontal component ofexposed portions of the silicon pillars below the nitride spacers toapproximately the width of nitride spacers.
 25. The method of claim 20,wherein the silicon pillar isolation material is a material selectedfrom the group consisting essentially of borophosphosilicate glass(BPSG), phosphosilicate glass (PSG), or a spin on dielectric (SOD). 26.The method of claim 20, wherein the planarizing the conformalpolysilicon material and the silicon pillar isolation material compriseschemical-mechanical planarization (CMP).
 27. The method of claim 20,wherein the recessing of the conformal polysilicon material continuesbelow the base of the nitrides spacers.
 28. The method of claim 20,wherein the insulation material to fill any gaps around the siliconpillars is a material selected from the group consisting essentially ofborophosphosilicate glass (BPSG), phosphosilicate glass (PSG), or a spinon dielectric (SOD).
 29. The method of claim 20, wherein exposing theupper surface of the silicon pillars to create a surface for avertical-surrounding-gate source contact comprises chemical-mechanicalplanarization (CMP).
 30. A method of forming a semiconductor assemblyhaving vertical transistor structures comprising: forming partialsilicon pillars by etching into a silicon substrate having isolationregions therein, to define a vertical transistor source for eachvertical transistor structure; forming nitride spacers on sidewalls ofeach vertical transistor source; extending the overall length of thesilicon pillars by etching further into the silicon substrate to adesired depth below the nitride spacers, the extended length of thesilicon pillars defining a vertical transistor channel length for eachvertical transistor structure; forming a gate dielectric on the extendedlength of the silicon pillars below the nitride spacers; depositing aconformal polysilicon material over the silicon substrate, the nitridespacers and the transistor gate dielectric; forming a silicon pillarisolation material over the conformal polysilicon material; etching theconformal polysilicon material and the silicon pillar isolation materialto a base of the nitride spacers; recessing the conformal polysiliconmaterial to the base of the nitride spacers to form avertical-surrounding-gate of the vertical transistor structures suchthat the distance between an active area of the silicon pillars and anyportion of the recessed conformal polysilicon material that may residealong the nitride spacers is great enough to prevent an extension of thevertical transistor channel length of each vertical transistorstructure.
 31. The method of claim 30, wherein the etching of thepartial silicon pillars comprises an etch that defines approximately onehalf the total length of the silicon pillars.
 32. The method of claim30, further comprising etching a horizontal component of exposedportions of the silicon pillars below the nitride spacers toapproximately the width of nitride spacers.
 33. The method of claim 30,wherein the silicon pillar isolation material is a material selectedfrom the group consisting essentially of borophosphosilicate glass(BPSG), phosphosilicate glass (PSG), or a spin on dielectric (SOD). 34.The method of claim 30, wherein the etching the conformal polysiliconmaterial and the silicon pillar isolation material compriseschemical-mechanical planarization (CMP).
 35. The method of claim 30,wherein the recessing of the conformal polysilicon material continuesbelow the base of the nitrides spacers.
 36. A method of forming asemiconductor assembly with vertical transistor structures comprising:forming partial silicon pillars by etching into a silicon substratehaving isolation regions therein, to define a vertical transistor sourcefor each vertical transistor structure; forming nitride spacers onsidewalls of each vertical transistor source; extending the overalllength of the silicon pillars by etching further into the siliconsubstrate to a desired depth below the nitride spacers, the extendedlength of the silicon pillars defining a vertical transistor channellength for each vertical transistor structure; forming a gate dielectricon the extended length of the silicon pillars below the nitride spacers;depositing a conformal polysilicon material over the silicon substrate,the nitride spacers and the transistor gate dielectric; forming asilicon pillar isolation material over the conformal polysiliconmaterial; etching the conformal polysilicon material and the siliconpillar isolation material to a base of the nitride spacers; recessingthe conformal polysilicon material to the base of the nitride spacers toform a vertical-surrounding-gate of the vertical transistor structures;wherein the distance between an active area of the silicon pillars andany portion of the recessed conformal polysilicon material present alongthe nitride spacers is great enough to prevent an inversion of theactive area during an active state of a vertical transistor structure.37. The method of claim 36, wherein the etching of the partial siliconpillars comprises an etch that defines approximately one half the totallength of the silicon pillars.
 38. The method of claim 36, furthercomprising etching a horizontal component of exposed portions of thesilicon pillars below the nitride spacers to approximately the width ofnitride spacers.
 39. The method of claim 36, wherein the silicon pillarisolation material is a material selected from the group consistingessentially of borophosphosilicate glass (BPSG), phosphosilicate glass(PSG), or a spin on dielectric (SOD).
 40. The method of claim 36,wherein the etching the conformal polysilicon material and the siliconpillar isolation material comprises chemical-mechanical planarization(CMP).
 41. The method of claim 36, wherein the recessing of theconformal polysilicon material continues below the base of the nitridesspacers.
 42. A method of forming a semiconductor assembly having memorycells with vertical transistor structures comprising: forming partialsilicon pillars by etching into a silicon substrate having isolationregions therein, to define a vertical transistor source for eachvertical transistor structure; forming nitride spacers on sidewalls ofeach vertical transistor source; extending the overall length of thesilicon pillars by etching further into the silicon substrate to adesired depth below the nitride spacers, the extended length of thesilicon pillars defining a vertical transistor channel length for eachvertical transistor structure; forming a gate dielectric on the extendedlength of the silicon pillars below the nitride spacers; depositing aconformal polysilicon material over the silicon substrate, the nitridespacers and the transistor gate dielectric; forming a silicon pillarisolation material over the conformal polysilicon material; etching theconformal polysilicon material and the silicon pillar isolation materialto a base of the nitride spacers; recessing the conformal polysiliconmaterial to the base of the nitride spacers to form avertical-surrounding-gate of the vertical transistor structures suchthat the distance between an active area of the silicon pillars and anyportion of the recessed conformal polysilicon material present along thenitride spacers is great enough to prevent an inversion of the activearea during an active state of a vertical transistor structure; formingan anti-reflective coating to fill any gaps between the silicon pillars;patterning a photoresist overlying the anti-reflective coating to defineconductors connecting to a series of vertical-surrounding-gates; etchingthe polysilicon material to form the conductors from the polysilicongate material; depositing an insulation material around the siliconpillars; exposing the upper surface of the silicon pillars to create asurface for a vertical-surrounding-gate source contact; and forming acapacitor structure connecting the silicon pillars at thevertical-surrounding-gate source contact.
 43. The method of claim 42,wherein the etching of the partial silicon pillars comprises an etchthat defines approximately one half the total length of the siliconpillars.
 44. The method of claim 42, further comprising etching ahorizontal component of exposed portions of the silicon pillars belowthe nitride spacers to approximately the width of nitride spacers. 45.The method of claim 42, wherein the silicon pillar isolation material isa material selected from the group consisting essentially ofborophosphosilicate glass (BPSG), phosphosilicate glass (PSG), or a spinon dielectric (SOD).
 46. The method of claim 42, wherein the etching theconformal polysilicon material and the silicon pillar isolation materialcomprises chemical-mechanical planarization (CMP).
 47. The method ofclaim 42, wherein the recessing of the conformal polysilicon materialcontinues below the base of the nitrides spacers.
 48. A method offabricating a vertical transistor comprising: forming a vertical pillarof silicon having a vertical side surface; forming a gate insulatoradjacent to a lower region of the vertical side surface, the gateinsulator having a first lateral thickness and a vertical height;forming a spacer adjacent to an upper region of the vertical sidesurface and above the gate insulator, the spacer having a second lateralthickness which is greater than the first lateral thickness; and forminga gate structure adjacent to the gate insulator such that the gateinsulator is located between the gate structure and the pillar ofsilicon, wherein an upper portion of the gate structure which verticallyextends above the gate insulator height is laterally spaced from thepillar of silicon by the second lateral thickness.
 49. Verticaltransistor structures for a semiconductor assembly comprising: columnsof trench isolation material in a silicon substrate; nitride spacers onsidewalls along an upper vertical portion of silicon pillars, thesilicon pillars having a defined transistor channel length extending ina vertical direction below the nitride spacers; a gate dielectric on anexposed portion of the silicon pillars below the nitride spacers; and apolysilicon material wrapped around the silicon pillar along the definedtransistor channel length to form a vertical-surrounding-gate of eachvertical transistor structure.
 50. The vertical transistor structures ofclaim 49, wherein a horizontal component of the silicon pillars definingthe transistor channel length is recessed to approximately the width ofnitride spacers.
 51. The vertical transistor structures of claim 49,wherein the gate dielectric comprises oxide.
 52. A semiconductorassembly having vertical transistor structures comprising: columns oftrench isolation material in a silicon substrate; nitride spacers onsidewalls along an upper vertical portion of silicon pillars, thesilicon pillars having a defined transistor channel length extending ina vertical direction below the nitride spacers; a gate dielectric on anexposed portion of the silicon pillars below the nitride spacers; and apolysilicon material wrapped around the silicon pillar along the definedtransistor channel length to form a vertical-surrounding-gate of eachvertical transistor structure.
 53. The semiconductor assembly of claim52, wherein a horizontal component of the silicon pillars defining thetransistor channel length is recessed to approximately the width ofnitride spacers.
 54. The semiconductor assembly of claim 52, wherein thegate dielectric comprises oxide.
 55. A vertical transistor comprising: apillar of silicon extending vertically above a substrate, the pillarhaving a vertical side surface; a spacer having a first lateralthickness and formed adjacent to an upper region of the vertical sidesurface; a gate insulator having a second lateral thickness which isless than the first lateral thickness, the gate insulator is formedadjacent to a lower region of the vertical side surface, the spacer islocated vertically above the gate insulator such that a physicalvertical junction is defined between the spacer and gate insulator; anda transistor gate structure formed adjacent to the spacer and gateinsulator such that the spacer and gate insulator are located betweenthe transistor gate structure and the pillar of silicon such that a topportion of the transistor gate which vertically extends above thevertical junction is laterally spaced from the pillar of silicon by thesecond lateral thickness.